http://web.phys.ntnu.no/~stovneng/TFY4155_2007/english/ex5.pdf Webb1 juli 2002 · The in-line and at-line measurement tools for critical dimension (CD) metrology in semiconductor manufacturing are technologically advanced instruments that exhibit excellent measurement repeatability - below one nanometer in some cases. Accuracy, however, is largely dependent upon the availability of traceable standards. Because the …

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