Diffusive plasma dechucking
WebSep 1, 2001 · For the former, reasonable agreement with theoretical calculations was obtained when taking the corresponding dielectric constants and a finite gap between … Webcharge in a plasma chamber is provided. The electrostatic clamping Voltage is removed. An essentially argon free dechucking gas is provided into the plasma chamber. A dechucking plasma is formed from the dechucking gas in the plasma chamber. The dechucking plasma is stopped. 20 Claims, 4 Drawing Sheets 305 \ 306 1. 300 307 2 301 311 303 …
Diffusive plasma dechucking
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WebA plasma dechucking method capable of effectively eliminating dust particles created during the plasma process was developed. Referred to as diffusive plasma … WebThe method of claim 10 wherein said dechucking voltage has a peak amplitude which linearly diminishes with time. 14. The method of claim 10 wherein said dechucking voltage increase in frequency with time. 15. The method of claim 10 wherein said dechucking voltage is passively produced using energy stored between the workpiece and …
Webthrough plasma contacting the wafer. The wafer dechuck is done by switching offthe high voltage in a presence of plasma, and after the charge extinction the wafer is lifted up by … Webthrough plasma contacting the wafer. The wafer dechuck is done by switching offthe high voltage in a presence of plasma, and after the charge extinction the wafer is lifted up by pins in the absence of plasma. In volume produc-tion of plasma-assisted semiconductor process, a number of silicon wafers are required to be speedily chucked and
WebAbstract. The present invention completely dechucks a wafer attached to an electrostatic chuck of a LAM Research TCP / Rainbow Series device, which is a semiconductor device. (Dechucking: A dechucking kit) which allows a substrate fixed to a substrate fixing device such as an electrostatic chuck to be detached from the electrostatic chuck. Websectioned cathode. Lilac color inside discharge chamber corresponds to the diffusive plasma. Gas flow rate of this installation is 300 m3/hour. Steady-state normal anode layer is characterized by much lower electric field compared to that in cathode layer. However anode spot is much more dangerous for stability of a diffusive plasma column
WebWhat is claimed is: 1. A method for dechucking a substrate from an electrostatic chuck (ESC) in a plasma processing system, comprising: flowing a first gas into a plasma …
WebMay 29, 2013 · A plasma dechucking method capable of effectively eliminating dust particles created during the plasma process was developed. Referred to as diffusive plasma dechucking (DPD), the method reduces the plasma potential and includes an … quick round steak recipes easyhttp://www.jspf.or.jp/PFR/PDF/pfr2008_03-051.pdf quicksall engineeringWebdechucking. Figure 2 shows the bipolar ESC dechucking sequence. A postive backside He pressure setpoint initiates a preprogrammed clamping sequence. Turning off the … quick safety messageWebDec 19, 2012 · Plasma is generated at the plasma generating space above the wafer W. The plasma is substantially at ground potential. ... stopping the dechucking step of dechucking the processing object from the electrostatic chuck using the support pin when the detected pressure value continues to be greater than 2.6 Torr (346.6 Pa) after … quick safe shotgun bed mountedWebApr 5, 2011 · Methods and systems for temperature enhanced chucking and dechucking of resistive substrates in a plasma processing apparatus are described herein. In certain embodiments, methods and systems incorporate modulating a glass carrier substrate temperature during a plasma etch process to chuck and dechuck the carrier at first … shipwreck kelly footballWebMay 6, 2024 · Methods and apparatus for dechucking a wafer from a surface of an electrostatic chuck (ESC). In some embodiments, a method comprises reducing a pressure of a gas applied to a backside of the wafer to approximately zero psi; reducing a downward pressure in a cylinder bore of a lifting actuator to approximately atmospheric pressure … quick salvage new worldWebIt is noted that a dechuck control method according to an embodiment of the present invention is for dechucking a processing object from an electrostatic chuck that electrostatically attracts the processing object and includes a chuck electrode, and may include the steps of turning off the voltage applied to the chuck electrode after a plasma ... shipwreck kelly\\u0027s